- Author
- Mule'Stagno, Luciano.
- Title
- QUANTITATIVE NON-DESTRUCTIVE STUDY OF SUB-MICRON DEFECTS IN VERY LARGE SCALE INTEGRATED-CIRCUIT SILICON USING TRANSMITTED AND REFLECTED INFRA-RED LASER SCATTERING (VLSI).
- Source
- Dissertation Abstracts International. Volume: 57-10, Section: B, page: 6326.
- Abstract
- The limits and capabilities of the Scanning
Infra-Red Microscope (SIRM) and the Optical Precipitate Profiler (OPP) to
detect oxygen precipitate defects in silicon were investigated. Two sets of
specimens were made and studied. One set had wafers containing the same
bulk defect density, but had different precipitate growth thermal treatments.
These treatments resulted in defects of different mean sizes ranging from 30
to 150 nm. The other set had defects of approximately the same size, but
they had different defect densities ranging from about
1 x 10^9 defects/cm^3 to 1 x 10^(11) defects/cm^3. The first set was
carefully characterized by transmission electron microscopy (TEM) to
obtain an accurate size distribution of the defects in each sample.
The defect densities were then measured by the OPP, the SIRM, and the
cleave-and-etch technique and compared with the TEM measurements.
In the second sample the defect density was measured only by the
cleave-and-etch technique and then by the SIRM.
It was found that the scattering by precipitates in the SIRM and
OPP varied with equivalent defect radius as
r^(6.1+/-0.9) and r^(3.2+/-0.3), respectively. These results are
consistent with simple Rayleigh scattering theoretical dependencies
of r^6 and r^3, within measurement error. The two instruments also
revealed the same bulk microdefect density as found using the TEM and
the cleave-and-etch technique. Graphs of scattering versus precipitate
dimensions were plotted to establish the dependence of scattering on
defect sizes. These graphs can be used as calibration curves for the
instruments in future studies. It was found that both instruments were
unable to resolve very small precipitates found after short growth thermal
cycles at 1000 degrees C. The OPP was able to detect precipitates down
to an equivalent radius of about 15 nm, while the SIRM detected precipitates
having an equivalent radius of about 30 nm or larger. It was also found
that these instruments have a limit on the maximum density of defects which
they can detect.
For densities higher than a critical density the scattering signal does not
increase. This is expected due to the finite volume sampled by the beams
that these instruments use. For the SIRM this critical density was found to
be about 5 x 10^(10) defects/cm^3, which implied a sampling probe volume
of 16 um^3--which is within 20% of that predicted by theory.